M. Feldman and J. Sun, “Resolution Limits in X-Ray Lithography,” J. Vac. Sci. Technol., B, vol. 10, no. 6, pp. 173-3176, Nov./Dec. 1992.

M. Feldman, L. Liu, S. Puduc, and C. Zhang, “Performance characteristics of a dual focus x-ray alignment microscope,” J. Vac. Sci. Technol., vol. B-13, no. 6, pp. 2660-2664, Nov./Dec. 1995.

M. Feldman and Z. Chunsheng, “High Resolution Scanning Microdensitometer,” R. Sci. Instru., vol. 68, no. 8, pp. 112-3115, August, 1997.

M. Feldman, “Phase Shift Microscopes,” J. Vac. Sci. Technol., vol. B-16, no. 6, pp. 3647-3650, Nov./Dec. 1998.

M. Feldman, “Thermal Compensation of X-Ray Mask Distortion,” J. Vac. Sci. Technol., vol. B-17, no. 6, pp. 3407-3410, Nov./Dec. 1999.

M. Feldman, G.S. Lee, D. Noel, C. Khan Malek, and R. Bass, “Generation of Arbitrary Three Dimensional Surfaces by X-Ray - Lithography,”  J. Vac. Sci. Technol., vol. B-18, no. 6, pp. 2976-2980, Nov./Dec. 2000.

M. Feldman, “High Resolution Scanning Microscope,” US Patent 6,246,477, June 12, 2001.

M. Feldman, M. Khan, and F. Cerrina, “Focusing X-ray Masks for Printing Very Narrow Features,” J. Vac. Sci. Technol., Nov./Dec. 2001.

M. Feldman, H. Smith, K. Murooka, and M. Lim, “Adaptive Lithography Membrane Masks,” US Patent 6,404,481, June 11, 2002.

X. Zhuang, D. Conkerton, A. Lal, L. Jiang, M. Feldman, T. O'Reilly, and H. Smith, “Adaptive Membrane Masks,” J. Vac. Sci. Technol., vol. B-21, no. 6, pp 3082-3085, Nov./Dec. 2003.

M. Feldman, A. El-Amawy, and R. Vaidyanathan, “Optical Crossbar Switch,” US patent 6,792,175, September 14, 2004.

L. Jiang and M. Feldman, “Technique for Separately Viewing Multiple Levels,” J. Vac. Sci. Technol., B 22, p. 3405, Nov./Dec. 2004.

D. Amy, L. Jiang, R. Zheng, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, and D. Thielman, “Minimal Zone Plates for X-ray Lithography,” J. Vac. Sci. Technol. B22, p. 3570, Nov./Dec. 2004.

Li Jiang and M. Feldman, “Portable Coordinate Measuring Tool,”  J. Vac. Sci. Technol. B 23, 3056 (2005).

R. Zheng, L. Jiang, and M. Feldman, “Properties of Zone Plates used for Lithography,” J. Vac. Sci. Technol. B 24, 2844 (2006).

Y. Jeon, M. Feldman, and L. Jiang, “Ultrastiff Stage for Imprint Lithography,” J. Vac. Sci. Technol. B 25, 2317 (2007).

L. Jiang and M. Feldman, “A Prototype Optical Encoder System with Nanometer Measurement Capability,” TMOP Journal of Modern Optics, to be published, 2010.

M. Feldman, “Digital Image Pointing and Digital Zoom Optical System,” US patent 7,715,109, May 11, 2010.