M. Feldman and J. Sun, "Resolution Limits in X-Ray Lithography," J. Vac. Sci. Technol., B, vol. 10, no. 6, pp. 173-3176, Nov./Dec. 1992.

H. Zhou, M. Feldman, and R. Bass, "Subnanometer alignment system for x-ray lithography," J. Vac. Sci. Tech, vol. B 12, no. 6, pp. 3261-3264, Nov./Dec. 1994.

M. Feldman, L. Liu, S. Puduc, and C. Zhang, "Performance characteristics of a dual focus x-ray alignment microscope," J. Vac. Sci. Technol., vol. B-13, no. 6, pp. 2660-2664, Nov./Dec. 1995.

M. Feldman and Z. Chunsheng, "High Resolution Scanning Microdensitometer," R. Sci. Instru., vol. 68, no. 8, pp. 112-3115, August, 1997.

M. Feldman, "Phase Shift Microscopes," J. Vac. Sci. Technol., vol. B-16, no. 6, pp. 3647-3650, Nov./Dec. 1998.

M. Feldman and D. Smith, "Wafer Chuck for Magnification Correction in X-Ray Lithography," J. Vac. Sci. Technol., vol. B-16, no. 6, pp. 3476-3479, Nov./Dec. 1998.

M. Hasan and M. Feldman, "Phase Grating Modulator," R. Sci. Instru, Vol 70, no. 1, pp. 11-13, Jan. 1999.

M. Feldman, "Thermal Compensation of X-Ray Mask Distortion," J. Vac. Sci. Technol., vol. B-17, no. 6, pp. 3407-3410, Nov./Dec. 1999.

M. Feldman, G.S. Lee, D. Noel, C. Khan Malek, and R. Bass, "Generation of Arbitrary Three Dimensional Surfaces by X-Ray - Lithography,"  J. Vac. Sci. Technol., vol. B-18, no. 6, pp. 2976-2980, Nov./Dec. 2000.

X. Zhuang and M. Feldman, "Distortion Correction in Adaptive Membrane Masks," J. Vac. Sci. Technol., Nov./Dec. 2001.

M. Feldman, M. Khan, and F. Cerrina, "Focusing X-ray Masks for Printing Very Narrow Features," J. Vac. Sci. Technol., Nov./Dec. 2001.

X. Zhuang, D. Conkerton, A. Lal, L. Jiang, M. Feldman, T. O'Reilly, and H. Smith, "Adaptive Membrane Masks," J. Vac. Sci. Technol., vol. B-21, no. 6, pp 3082-3085, Nov./Dec. 2003.

L. Jiang and M. Feldman, "Technique for Separately Viewing Multiple Levels," J. Vac. Sci. Technol., B 22, p. 3405, Nov./Dec. 2004.

Bong Mo Park, Sang Woon Ha, Gil Sik Lee, Hoi-Yee Wong, Martin Feldman, and Sang Kyeong Yun, "Piezoelectric Projective Displays, " J. Vac. Sci. Technol. B22, p. 3151, Nov./Dec. 2004.

D. Amy, L. Jiang, R. Zheng, M. Feldman, F. Cerrina, S. Dhuey, Q. Leonard, and D. Thielman, "Minimal Zone Plates for X-ray Lithography," J. Vac. Sci. Technol. B22, p. 3570, Nov./Dec. 2004.

L. Jiang and M. Feldman, "Temperature Distributions to Correct Distortions in Membrane Masks," J. Vac. Sci. Technol. B22, p. 3581, Nov./Dec. 2004.