KARL SUSS MLB 3 MASK ALIGNMEER

For wafers up to 3" diameter. A 350 W Hg short-arc lamp for exposure with primary exposure wavelength in 350 nm region. The aligner performs exporsures in hard, soft and proximity contact mode. Line /space resolution of 1.5 microns and alignment accuracies of 0.2 micron can be obtained under optimum conditions.